| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum film deposition apparatus capable of increasing the degree of vacuum of a vessel in a short time. Ž<P>SOLUTION: The vacuum film deposition apparatus includes: a reaction vessel provided with a space part 101d capable of arranging a substrate; a film deposition means installed in the space part 101d; an exhaust means for making the inside of the space part 101d into a reduced pressure state; an opening part 101c which is provided on one face of the reaction vessel and communicated to the space part 101d; a door part 107 which is attached so as to cover the opening part 101c and opens or closes freely the opening part 101c; a frame part 803 which is attached to the outer periphery of the opening part 101c or the door part 107; a groove part 803c formed in the frame part 803 to surround the opening part 101c; an O-ring 802 which is fitted into the groove part 803c; and a heating part 804 which is attached to the frame part 803 and heats the frame part 803. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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