LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

摘要

Disclosed is a liquid processing apparatus to perform liquid processing by supplying a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally in a state where a back surface of the substrate faces downward. The liquid processing apparatus prevents droplets from remaining on the member. The liquid processing apparatus includes a nozzle member irrotationally provided below the substrate. The nozzle member includes a processing-liquid discharge nozzle to discharge the processing liquid and a gas discharge nozzle to discharge drying gas on a top surface of the nozzle member. The processing-liquid discharge nozzle includes a processing-liquid discharge port to discharge the processing liquid toward the substrate. The gas discharge nozzle includes a first gas discharge port to discharge the drying gas toward the substrate, and a plurality of second gas discharge ports to discharge the drying gas in a radial direction along the top surface of the nozzle member.