发明名称 CORRECTION METHOD FOR COLOR FILTER SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique for reforming a photo spacer and a protrusion for alignment control accompanying a local defect part since abnormal alignment of a liquid crystal is generated when such a defective part that a photo spacer or a protrusion for alignment control in contact with the liquid crystal is peeled or separated locally, with insufficiency in the adhesive force to an underlayer is generated. <P>SOLUTION: In a correction method of a color filter substrate wherein at least a black matrix, colored pixels, a transparent conductive film, the photo spacer and the protrusion for alignment control are formed on a glass substrate, the defective part is repaired, by applying a reforming ink to the defective part and making the ink cure, when the photo spacer or the protrusion for alignment control has the defective part. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010175912(A) 申请公布日期 2010.08.12
申请号 JP20090019420 申请日期 2009.01.30
申请人 TOPPAN PRINTING CO LTD 发明人 SHIMIZU MIYUKI;KIMURA YUKIHIRO
分类号 G02F1/1335;G02F1/13;G02F1/1337;G02F1/1339 主分类号 G02F1/1335
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