发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST
摘要 <p>The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1): and one or more arylalkoxysilane compounds represented by the following general formula (2): , (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.</p>
申请公布号 EP2216682(A1) 申请公布日期 2010.08.11
申请号 EP20080850248 申请日期 2008.11.12
申请人 ADEKA CORPORATION 发明人 MORITA, HIROSHI;SATO, HIROMI;KOBAYASHI, ATSUSHI;OMI, JINICHI;SAITO, SEIICHI
分类号 G03F7/075;C08G77/16;C08G77/50;C08K5/23;C08L83/06;G03F7/023;G03F7/40;H01L23/29 主分类号 G03F7/075
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