发明名称 |
POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST |
摘要 |
<p>The present invention provides: a positive photosensitive composition that yields an insulation layer superior not only in high transparency, but also in heat resistance enduring a temperature during the production of a substrate, solvent resistance, and anti-aging property as a permanent resist; a positive permanent resist utilizing the positive photosensitive composition; and a method for producing the positive permanent resist. The present invention provides: a positive photosensitive composition containing (A) a curable silicone resin having a silanol group, which resin has a structure obtained by a reaction between one or more cyclic siloxane compounds represented by the following general formula (1):
and one or more arylalkoxysilane compounds represented by the following general formula (2):
, (B) diazonaphthoquinones, and (C) a solvent; a positive permanent resist using the positive photosensitive composition; and a method for producing the positive permanent resist.</p> |
申请公布号 |
EP2216682(A1) |
申请公布日期 |
2010.08.11 |
申请号 |
EP20080850248 |
申请日期 |
2008.11.12 |
申请人 |
ADEKA CORPORATION |
发明人 |
MORITA, HIROSHI;SATO, HIROMI;KOBAYASHI, ATSUSHI;OMI, JINICHI;SAITO, SEIICHI |
分类号 |
G03F7/075;C08G77/16;C08G77/50;C08K5/23;C08L83/06;G03F7/023;G03F7/40;H01L23/29 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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