发明名称 SCHOTTKY DIODE FOR HIGH-POWER APPLICATION AND METHOD FOR MAKING SAME
摘要 The invention relates to a Schottky diode that comprises a substrate (24), an active layer (21) made of a semiconducting material, a so-called Schottky contact layer (27), an ohmic contact conducting layer (25), said substrate further including at least one via-hole (28) in order to define a membrane above said via-hole, having a so-called lower face at the level of the substrate and a so-called upper face remote from the substrate, characterised in that the membrane includes at least the following stack of layers starting from said so-called lower face: the so-called Schottky contact layer; the layer of semi-conducting material; the ohmic contact layer being at the upper face of said membrane. The invention also relates to a method for making such a diode.
申请公布号 EP2215660(A1) 申请公布日期 2010.08.11
申请号 EP20080857602 申请日期 2008.11.28
申请人 THALES 发明人 DELAGE, SYLVAIN;BRYLINSKI, CHRISTIAN;MORVAN, ERWAN;DEAN, THIERRY
分类号 H01L29/872 主分类号 H01L29/872
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