发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus that suppresses the degradation of productivity even when a process fault is generated. <P>SOLUTION: The plasma processing apparatus includes a processing chamber for performing plasma processing according to a process condition to an workpiece G. The plasma processing apparatus includes a control system 50 including a storage unit which stores a plurality of reprocessing conditions different from the processing condition, a supervising function for supervising the presence of fault generation during plasma processing, and a decision function for determining the kind of the fault. When any fault is generated, the control system 50 selects one reprocessing condition from the plurality of reprocessing conditions according to the determined kind of fault and performs reprocessing to the workpiece G. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010171288(A) 申请公布日期 2010.08.05
申请号 JP20090013802 申请日期 2009.01.26
申请人 TOKYO ELECTRON LTD 发明人 TANAKA SEIJI;FUJINAGA MOTOTAKE
分类号 H01L21/3065;H01L21/205;H01L21/31;H05H1/00;H05H1/46 主分类号 H01L21/3065
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