发明名称 |
LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS |
摘要 |
An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
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申请公布号 |
US2010193710(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20090580523 |
申请日期 |
2009.10.16 |
申请人 |
WAKABAYASHI OSAMU;ENDO AKIRA;NOWAK KRZYSZTOF;SUGANUMA TAKASHI;MORIYA MASATO |
发明人 |
WAKABAYASHI OSAMU;ENDO AKIRA;NOWAK KRZYSZTOF;SUGANUMA TAKASHI;MORIYA MASATO |
分类号 |
H05G2/00;H01S3/0941;H01S3/10;H01S3/22 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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