ELECTRON BEAM EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposure system.

SOLUTION: The electron beam exposure system transfers a pattern onto the surface of a target (14). The electron beam exposure system includes: a beamlet generator generating a plurality of electron beamlets (5a, 5b); a modulation array that includes a plurality of modulators modulating intensity of the electron beamlets and receives the plurality of electron beamlets; a controller connected to the modulation array for controlling the respective modulators independently; a regulator operatively connected to the respective modulators so that control signals of the respective modulators are adjusted individually; a convergent electron optical system including an array of electrostatic lenses (7), where each focuses a corresponding and individual beamlet transmitted by the modulation array on a section smaller than 300 nm; and a target holder for holding the target on an exposed surface of the pattern where the pattern is transferred in a first convergent surface of the convergent electron optical system.

COPYRIGHT: (C)2010,JPO&INPIT