| 摘要 |
An exposure apparatus EX includes a light source unit 1 which emits an exposure light beam EL; and an illumination system IL which includes a splitting optical system 13 splitting the exposure light beam EL emitted from the light source unit 1 into a first exposure light beam EL1 and a second exposure light beam EL2, and which illuminates a first pattern PA1 with the first exposure light beam EL1 and illuminates a second pattern PA2 with the second exposure light beam EL2; wherein a predetermined area on a substrate P is multiply exposed by radiating the first exposure light beam EL1 from the first pattern PA1 and the second exposure light beam EL2 from the second pattern PA2 onto the predetermined area on the substrate P. |
