发明名称 Ferroelectric thin films
摘要 Ferroelectric structures and methods of making the structures are presented. The ferroelectric structures can include an electrode in contact with a ferroelectric thin film. The contact can be arranged so that a portion of the atoms of the ferroelectric thin film are in contact with at least a portion of the atoms of the electrode. The electrode can be made of metal, a metal alloy, or a semiconducting material. A second electrode can be used and placed in contact with the ferroelectric thin film. Methods of making and using the ferroelectric structures are also presented.
申请公布号 US7768050(B2) 申请公布日期 2010.08.03
申请号 US20070774793 申请日期 2007.07.09
申请人 THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA 发明人 RAPPE ANDREW MARSHALL;SAI NA;KOLPAK ALEXIE MICHELLE
分类号 H01L29/76;H01L21/00;H01L29/94 主分类号 H01L29/76
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