发明名称 HIGH QUALITY SEMICONDUCTOR MATERIAL
摘要 A hydrogenated, silicon based semiconductor alloy has a defect density of less than 1016 cm-3. The alloy may comprise a hydrogenated silicon alloy or a hydrogenated silicon- germanium alloy. Hydrogen content of the alloy is generally less than 15%, and in some instances less than 11%. The tandem photovoltaic devices which incorporate the alloy exhibit low levels of photo degradation. In some instances, the material is fabricated by a high speed VHF deposition process.
申请公布号 WO2010054164(A3) 申请公布日期 2010.07.29
申请号 WO2009US63508 申请日期 2009.11.06
申请人 UNITED SOLAR OVONIC LLC;XU, XIXIANG;GUHA, SUBHENDU;YANG, CHI 发明人 XU, XIXIANG;GUHA, SUBHENDU;YANG, CHI
分类号 H01L31/042 主分类号 H01L31/042
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