发明名称 PLASMA PROCESSING APPARATUS
摘要 <p>A plasma processing apparatus which is able to acquire data useful in determining the cause of an abnormal discharge during plasma processing and secure traceability. The plasma processing apparatus holds a substrate (9) inside a processing chamber (3a) to subject it to plasma processing. The plasma processing apparatus is provided with a discharge detection sensor (23) which detects an abnormal discharge inside the processing chamber (3a) and a camera (26) which captures images of the processing chamber (3a) interior through a window part (2a) and outputs moving image data. The plasma processing apparatus, when an abnormal discharge has been detected, stores moving image data corresponding to the time period that includes the time of detection of the abnormal discharge, and, when abnormal discharge has not been detected, stores the data of the moving images or still images, which show the normal discharge state, as normal history image data showing that plasma processing has been carried out. Due to this, it becomes possible to acquire data useful for determining the cause of abnormal discharge and secure traceability.</p>
申请公布号 WO2010084778(A1) 申请公布日期 2010.07.29
申请号 WO2010JP00404 申请日期 2010.01.25
申请人 PANASONIC CORPORATION;NONOMURA, MASARU;HAJI, HIROSHI;ARITA, KIYOSHI 发明人 NONOMURA, MASARU;HAJI, HIROSHI;ARITA, KIYOSHI
分类号 H05H1/46;G05B19/418;H01L21/304;H05H1/00 主分类号 H05H1/46
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