发明名称 SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING DEVICE, CAMERA, AND DRIVE METHOD
摘要 The semiconductor element according to an aspect of the present invention is a solid-state imaging element formed on a semiconductor substrate, having an overflow drain structure for draining excessive charges generated in photoelectric conversion elements, and reading out signal charges accumulated in the photoelectric conversion elements to a vertical transfer unit via a readout gate electrode. The solid-state imaging element includes: a first voltage generating circuit which applies, to the semiconductor substrate, substrate voltage defining the height of overflow barrier in the overflow drain structure; and a second voltage generating circuit which selectively generates first voltage and second voltage each including the height of pulse wave superimposed onto the substrate voltage, at a time when readout pulse to be applied to the readout gate electrode is generated.
申请公布号 US2010188536(A1) 申请公布日期 2010.07.29
申请号 US20080670040 申请日期 2008.07.09
申请人 PANASONIC CORPORATION 发明人 HASUKA TSUYOSHI;KURIYAMA TOSHIHIRO;MORI HIROYUKI;MANABE JUNJI
分类号 H01L27/148;H01L31/101;H04N5/335;H04N5/347;H04N5/359;H04N5/369;H04N5/372 主分类号 H01L27/148
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