A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING,申请号WO2009IB05143-传众专利搜索

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发明名称	A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING
摘要	<p>A process for forming a double photoresist pattern is disclosed.</p>
申请公布号	WO2010084372(A1)	申请公布日期	2010.07.29
申请号	WO2009IB05143	申请日期	2009.03.30
申请人	AZ ELECTRONIC MATERIALS USA CORP.	发明人	CAO, YI;THIYAGARAJAN, MUTHIAH;HONG, SUNGEUN;LEE, DONGKWAN;LI, MENG;MIKRUT, DAVID
分类号	G03F7/00;G03F7/20;G03F7/40;H01L21/027	主分类号	G03F7/00
代理机构		代理人
主权项
地址

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