| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system (IL) and an outlet connected to a pumping system to pump away gas from between an inner wall (64) and outer wall (62) of the illumination system (IL) or, if a radiation source is present, between the inner wall (64) of the illumination system (IL) and an inner wall (62) of the radiation source .
|
| 申请公布号 |
KR20100085045(A) |
申请公布日期 |
2010.07.28 |
| 申请号 |
KR20107008430 |
申请日期 |
2008.09.17 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DE VIJVER YURI JOHANNES GABRIEEL;VAN EMPEL TJARKO ADRIAAN RUDOLF;VAN SCHOOT JAN BERNARD PLECHELMUS;SWINKELS GERARDUS HUBERTUS PETRUS MARIA;SCHIMMEL HENDRIKUS GIJSBERTUS;LABETSKI DZMITRY |
| 分类号 |
G03F7/20;G21K1/00;H05G2/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
