| 摘要 |
A method of forming a matrix of electrowetting pixels includes forming a patterned layer of electrodes (512) on a substrate (510) and forming a patterned insulating layer (514) on the electrodes (512) and the substrate (510) to define a plurality of wells (516), each of the wells (516) aligned over one of the electrodes (512). A hydrophobic material (518) is formed on the bottom surfaces of the wells (516) and a hydrophilic material (526) is formed on sidewalls (519) of the wells (516), for example by one of selective reaction, selective deposition and selective etching, by the application of a beam (524) at an angle to impact the sidewalls (519) while substantially avoiding impacting the bottom surface (515). First and second liquids (532, 534) are disposed within the wells (516), the first liquid being not soluble in the second liquid. |
