PHOTO MASK USED IN FABRICATION OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A photomask is provided to be used for transferring mask patterns on a photoresist film even when a semiconductor substrate has step difference under a dipole illumination system of projection exposure equipment and to stabilize a lithography process. CONSTITUTION: A photomask(2) is transferred on a semiconductor substrate having upper and lower step differences of the substrate. The upper and lower parts are located in different heights using a dipole illumination system. The photomask includes first and second patterns(10,20) having first and second concave-convex parts. The first and second mask patterns correspond to the lower difference of the semiconductor substrate.