发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING NON-VOLATILE MEMORY DEVICE
摘要 Provided are nonvolatile memory devices with a three-dimensional structure and methods of fabricating the same. The nonvolatile memory device includes conductive patterns three-dimensionally arranged on a semiconductor substrate, semiconductor patterns that extend from the semiconductor substrate and intersect one-side walls of the conductive patterns, charge storage layers interposed between the semiconductor patterns and one-side walls of the conductive patterns, and seed layer patterns interposed between the charge storage layers and one-side walls of the conductive patterns.
申请公布号 US2010181610(A1) 申请公布日期 2010.07.22
申请号 US20090650076 申请日期 2009.12.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM YOUNG-HOO;KANG DAEHYUK;KIM YOUNGOK;BAE SANG WON;YOON BOUN;LEE KUNTACK
分类号 H01L29/792 主分类号 H01L29/792
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