PLASMA TREATMENT APPARATUS, IMPEDANCE MATCHING DEVICE, COUPLER

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus to which an electric circuit is electrically stably attached.

SOLUTION: A socket 40 provided in an output portion of an impedance matching device is provided with an inserting hole 41 for inserting and holding a power supply bar 32 into a center of a metal body 40a formed in a cylindrical shape. A coated layer 42 including an insulator is provided in an inner wall of the inserting hole 41, and a space between the socket 40 and the power supply bar 32 is electrically insulated. High frequency electric power generated with a second high frequency power supply 51 is transferred to the power supply bar 32 by inductive coupling.

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