发明名称 RESISTANCE VARIABLE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a resistance variable memory device and a method of fabricating the same. SOLUTION: The resistance variable memory device includes at least one bottom electrode, a first insulating layer containing a trench which exposes the at least one bottom electrode, and a resistance variable material layer including respective first and second portions located on opposite sidewalls of the trench, respectively, where the first and second portions of the resistance variable material layer are electrically connected to the at least one bottom electrode. The device further includes a protective layer covering the resistance variable material layer within the trench, and a second insulating layer located within the trench and covering the protective layer within the trench. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010161376(A) 申请公布日期 2010.07.22
申请号 JP20100004343 申请日期 2010.01.12
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK HYE-YOUNG;HA YONG-HO;PARK JEONG-HEE;OH JIN HO;KWON HYUN SUK
分类号 H01L27/105;G11C13/00;H01L45/00 主分类号 H01L27/105
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