| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables a resist pattern of proper configuration to be formed, and to provide a resist pattern forming method that uses the resist composition. <P>SOLUTION: The resist composition contains: a base component (A), which exhibits changed solubility in an alkali developer under the action of an acid; an acid generator component (B) which generates an acid upon exposure; and a nitrogen-containing compound (D). The nitrogen-containing organic compound (D) contains a compound (D1), represented by general formula (d1), wherein R<SP>1</SP>-R<SP>4</SP>are each independently an alkyl group which may have a substituent, and R<SP>5</SP>is a hydrocarbon group which may have a substituent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
