发明名称 PHOTOCURABLE TRANSFER SHEET, AND METHOD OF FORMING AN UNEVEN PATTERN USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a photocurable transfer sheet advantageously usable to fabricate an intermediate stamper by a nanoimprint process method useful for fabrication of an electronic device, an optical component, a recording medium, etc., the photocurable transfer sheet being excellently releasable from a metal mold used therefor and having a fine uneven pattern and also excellently releasable from a photocurable resin of a product to which the uneven pattern is transferred from an intermediate stamper thereof, and further coming in excellent contact with a base film, and to provide a method of forming the fine uneven pattern using the photocurable transfer sheet. <P>SOLUTION: The photocurable transfer sheet 10 has a photocurable transfer layer 11 made of a photocurable composition capable of being deformed by being pressed, the photocurable composition contains a silicone-based resin and/or a fluorine atom-containing ethylenic compound as lubricant, the surface energy of the photocurable transfer layer 11 being >20 mN/m and <30 mN/m. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010161186(A) 申请公布日期 2010.07.22
申请号 JP20090002188 申请日期 2009.01.08
申请人 BRIDGESTONE CORP 发明人 INAMIYA TAKAHITO;HASHIMOTO KENJI;KAIDA EIZO
分类号 H01L21/027;B29C59/02;B29K33/04;B29K83/00;B29L7/00 主分类号 H01L21/027
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