发明名称 SUBSTRATE CARRYING DEVICE AND VACUUM PROCESSING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate carrying device capable of stable high speed carrying, by restraining swinging of a substrate tray and also dusting. Ž<P>SOLUTION: This substrate carrying device is composed of a carrier 20 attached with the substrate tray 23, a carrying mechanism 12 of the carrier, and a guide mechanism of the carrier for guiding an upper part of the carrier in a noncontact state, and is characterized in that the guide mechanism is constituted of a first magnet row 22 installed along a carrying passage in an upper part of the carrier and a second magnet row 14 installed in a vacuum chamber 10 along the carrying passage above or under this row. The first magnet row and the second magnet row are also arranged in a plurality of rows at a predetermined interval in the vertical direction to the carrying direction, and magnets are arranged so that attraction force operates between the opposed magnet rows and resiliency operates between the next opposed magnet rows. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010159167(A) 申请公布日期 2010.07.22
申请号 JP20100022829 申请日期 2010.02.04
申请人 CANON ANELVA CORP 发明人 KAJIWARA YUJI;OKAMOTO NAOYUKI
分类号 B65G49/06;B65G17/46;G09F9/00;H01L21/677 主分类号 B65G49/06
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