METHOD AND APPARATUS FOR ION IMPLANTATION OF NON-GASEOUS ELEMENTS

摘要

PURPOSE: A method and a device for implanting a solid element plasma ion are provided to implement a high function of a surface property by efficiently implanting a solid element ion to the surface of a sample at a room temperature. CONSTITUTION: An evaporator(24) is prepared for a thin film deposition. A vacuum state is maintained inside a vacuum chamber(10). A sample mount(13) is installed on the opposite position to the evaporator inside a vacuum chamber. A first power supply unit applies first power to the evaporator. The first power supply unit implants the plasma ions of the solid element sputtered from the evaporator to the surface of a sample(12).