| 摘要 |
The present invention relates to an exposure equipment and an exposure method that generates pulsed light by producing plasma from a target material to carry out exposure with the pulsed light and aims at obtaining a high degree of uniformity in the quantity of exposure light even when the pulsed light generated by producing plasma from the target material is used for a light source of exposure. The exposure equipment is characterized by having a light emitting portion that generates the pulsed light by producing plasma from the target material supplied intermittently, a reticle stage on which a reticle is arranged and irradiated with the pulsed light, a photosensitive substrate stage on which a photosensitive substrate irradiated with the pulsed light is arranged, the pulsed light being patterned by the reticle, and a control portion that controls the photosensitive substrate stage so that, before exposure onto the photosensitive substrate is started, the exposure starting point or the exposure ending point and the light emission timing coincide with each other based on the drive timing of the photosensitive substrate stage and the light emission timing of the pulsed light. |
