Volatile copper(1) complexes and processes for deposition of copper films by atomic layer deposition
摘要
Provided are novel 1,3-diimine copper complexes, and processes for using 1,3-diimine copper complexes in the deposition of copper on substrates, or in or on porous solids, by atomic layer deposition.
申请公布号
US7759508(B2)
申请公布日期
2010.07.20
申请号
US20070858431
申请日期
2007.09.20
申请人
发明人
BRADLEY ALEXANDER ZAK;THOMPSON JEFFERY SCOTT;PARK KYUNG-HO