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发明名称
Photolithography process method and wafer cooling unit for preventing ion charging on wafer
摘要
申请公布号
KR100971324(B1)
申请公布日期
2010.07.20
申请号
KR20080081830
申请日期
2008.08.21
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
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代理人
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