发明名称 NEGATIVE IMAGING METHOD FOR PROVIDING A PATTERNED METAL LAYER HAVING HIGH CONDUCTIVITY
摘要 Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic interference shielding devices and touchpad sensors.
申请公布号 KR20100082355(A) 申请公布日期 2010.07.16
申请号 KR20107011117 申请日期 2008.10.23
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 GAO FENG;JOHNSON LYNDA KAYE;KEUSSEYAN ROUPEN LEON;MALAJOVICH IRINA;METH JEFFREY SCOTT;SHARP KENNETH GEORGE;ZUMSTEG JR FREDRICK CLAUS;AGRAWAL SEEMA
分类号 B41M5/382;B41M5/392;H05K3/04;H05K3/18 主分类号 B41M5/382
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