发明名称 ALIGNMENT APPARATUS FOR SEMICONDUCTOR WAFER
摘要 PURPOSE: An apparatus for aligning a semiconductor wafer is provided to implement the alignment of a wafer by forming a supporting stage to be horizontally transferable in two directions which cross the supporting stage. CONSTITUTION: The size of a supporting stage(1) is larger than that of the outer shape of a wafer(W). An optical sensor(2) optically detects the peripheral position of a wafer on the supporting stage. Four guide pins(3) function as a guiding unit for centering the wafer. A flow path(5), which is connected with a vacuum unit, is formed inside of a frame(4). The flow path is connected with a plurality of vacuum holes(6) which is formed on the peripheral side the supporting stage. A driving unit rotates the supporting stage.
申请公布号 KR20100082313(A) 申请公布日期 2010.07.16
申请号 KR20100001133 申请日期 2010.01.07
申请人 NITTO DENKO CORPORATION 发明人 YAMAMOTO MASAYUKI;IKEDA SATOSHI
分类号 H01L21/68 主分类号 H01L21/68
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