METHODOLOGY OF PLACING PRINTING ASSIST FEATURE FOR RANDOM MASK LAYOUT

摘要

PURPOSE: A PrAF arrangement method for random mask layout is provided to appropriately arrange PrAF in mask layout on a double patterning process printing a semiconductor device feature. CONSTITUTION: A design feature with a designed feature is offered. A parameter set related to PrAF(Printing Assist Features) is generated(302). The PrAF of the parameter set is added in design layout. The PrAF and design feature about changed design layout are simulated(306). The removability of the PrAF is verified on the basis of the result of the simulation. In case the PrAF is removable, a PrAF arrangement rule set is generated on the basis of the parameter set(310).