发明名称 METHOD AND APPARATUS OF DRYING COATING FILM
摘要 PROBLEM TO BE SOLVED: To suppress evaporation or sublimation of additives contained in a coating film and at the same time quickly dry a solvent contained in the coating film. SOLUTION: The apparatus of drying a coating film formed by applying a polymer coating liquid to a support comprises first control means 47 for feedback control of drying conditions of a hot-air drying apparatus 28 to keep the coating film temperature lower than the melting point of a first additive, a vapor drying apparatus 29 for drying the coating film by using hot air containing vapor of a second solvent with a smaller molecular volume than that of the first solvent, a second temperature sensor 51 for measuring the coating film temperature in the vapor drying apparatus 29, and second control means 53 for feedback control of drying conditions of the vapor drying apparatus 29 to keep the coating film temperature lower than the melting point of the first additive based on the measurement results of the second temperature sensor 51. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010155203(A) 申请公布日期 2010.07.15
申请号 JP20080334771 申请日期 2008.12.26
申请人 FUJIFILM CORP 发明人 TAGUCHI TAKAO
分类号 B05D3/02;B05C9/14;B05D1/38;B05D7/00;B05D7/24;B41N1/14;F26B21/00;G03F7/00 主分类号 B05D3/02
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