FRONT END OF LINE PLASMA MEDIATED ASHING PROCESSES AND APPARATUS
摘要
Front end of line (FEOL) plasma mediated ashing processes for removing organic material from a substrate generally includes exposing the substrate to the plasma to selectively remove photoresist, implanted photoresist, polymers and/or residues from the substrate, wherein the plasma contains a ratio of active nitrogen and active oxygen that is larger than a ratio of active nitrogen and active oxygen obtainable from plasmas of gas mixtures comprising oxygen gas and nitrogen gas. The plasma exhibits high throughput while minimizing and/or preventing substrate oxidation and dopant bleaching. Plasma apparatuses are also described.
申请公布号
WO2010059252(A3)
申请公布日期
2010.07.15
申请号
WO2009US06270
申请日期
2009.11.20
申请人
AXCELIS TECHNOLOGIES, INC;LUO, SHIJIAN;ESCORCIA, ORLANDO;WALDFRIED, CARLO;BERRY, IVAN
发明人
LUO, SHIJIAN;ESCORCIA, ORLANDO;WALDFRIED, CARLO;BERRY, IVAN