发明名称 SOLID-STATE IMAGE SENSOR AND METHOD FOR PRODUCING THE SAME
摘要 A floating diffusion (331) is created substantially at center of the light-receiving surface of an embedded photodiode (31), with a gate electrode of a transfer transistor (32) surrounding the floating diffusion. The concentration (or depth) of impurities in a p+-type semiconductor region, n-type semiconductor region or p-well region is changed in an inclined form so that a potential gradient being inclined downwards from the circumference to the center is created when an appropriate bias voltage is applied to the pn junction. The photocharges produced by incident light are rapidly moved along the potential gradient toward the center. Even in the case where the photocharge storage time is short, the photocharges can be efficiently collected since the maximum moving distance from the circumference of the photodiode (31) to the floating diffusion (331). Thus, the photocharges produced by the photodiode (31) are efficiently utilized, whereby the detection sensitivity is improved.
申请公布号 US2010176423(A1) 申请公布日期 2010.07.15
申请号 US20080676520 申请日期 2008.09.04
申请人 TOHOKU UNIVERSITY;SHIMADZU CORPORATION 发明人 SUGAWA SHIGETOSHI;KONDO YASUSHI;TOMINAGA HIDEKI
分类号 H01L31/14;H01L31/0352;H01L31/18;H04N5/335;H04N5/374;H04N5/3745 主分类号 H01L31/14
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