发明名称 |
Electrostatic chuck with dielectric inserts |
摘要 |
An electrostatic chuck with dielectric inserts provides conveyance of cooling gas while eliminating arc path to a workpiece surface. The electrostatic chuck includes the workpiece surface configured to support a substrate such as a semiconductor wafer, a plenum configured to carry a cooling gas, and a plurality of dielectric inserts configured to provide communication of the cooling gas between the plenum and the workpiece surface. The dielectric inserts may comprise a passage to provide the communication of the cooling gas. The dielectric inserts may be further configured to prevent line-of-sight between the workpiece surface of the electrostatic chuck and a conducting surface within the electrostatic chuck.
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申请公布号 |
US2010177454(A1) |
申请公布日期 |
2010.07.15 |
申请号 |
US20090319633 |
申请日期 |
2009.01.09 |
申请人 |
COMPONENT RE-ENGINEERING COMPANY, INC. |
发明人 |
ELLIOT BRENT;BALMA FRANK;REX DENNIS GEORGE;VEYTSER ALEXANDER |
分类号 |
H01L21/683;H01B19/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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