发明名称 |
Concentrate of fine ceria particles for chemical mechanical polishing and preparing method thereof |
摘要 |
Disclosed are a concentrate of fine ceria particles for chemical mechanical polishing, and a method of preparing the same. The method includes reacting a reactant mixture comprising i) water, ii) an aqueous solution of water-soluble cerium salt compound, and iii) ammonia or ammonium salt at a reaction temperature of 250-700? under a reaction pressure of 180-550 bar for 0.01 sec to 10 min in a continuous reactor to obtain a solution containing the fine ceria particles, the cerium salt compound being contained at an amount of 0.01 to 20 wt % in the reactant mixture; and concentrating the solution containing the fine ceria particles in a concentrator having a filter with a pore size of 0.01 to 10?. The concentrate is advantageous in that a CMP slurry and a dispersing solution are easily produced by diluting the concentrate and adding an additive to the concentrate.
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申请公布号 |
US7754168(B2) |
申请公布日期 |
2010.07.13 |
申请号 |
US20040557940 |
申请日期 |
2004.05.21 |
申请人 |
HANWHA CHEMICAL CORPORATION |
发明人 |
PARK SE-WOONG;MYEONG WAN-JAE;BAIK JIN-SOO;CHUNG CHANG-MO;SONG KYU-HO |
分类号 |
C01F17/00;B24D3/00;C03C19/00;C09K3/14 |
主分类号 |
C01F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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