发明名称 Coating composition and low dielectric siliceous material produced by using same
摘要 The present invention provides a coating composition, which can simply produce a porous siliceous film having excellent mechanical strength and, at the same time, possessing a stable very low level of dielectric and good chemical resistance to various chemicals, and to provide a process for producing a siliceous material using the same. The coating composition according to the present invention comprises a polyalkylsilazane compound, an acetoxysilane compound, an organic solvent, and, if necessary, a pore forming material. The present invention also provides a siliceous material produced by firing the coating composition and a process for producing the same.
申请公布号 US7754003(B2) 申请公布日期 2010.07.13
申请号 US20040565429 申请日期 2004.08.04
申请人 AZ ELECTRONIC MATERIALS USA CORP. 发明人 AOKI TOMOKO;AOKI HIROYUKI
分类号 C09D183/00;B32B9/00;C08K5/541;C09D183/16;H01L21/312 主分类号 C09D183/00
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