POLYMER, POLYMER COMPOSITION, UNDER-LAYER COMPOSITION OF RESIST, AND PATTERNING METHOD OF MATERIALS USING THE SAME

摘要

PURPOSE: A polymer, polymer composition, and a resist lower layer composition are provided to minimize reflection between the resist and lower layer. CONSTITUTION: A polymer is denoted by a repeat unit of chemical formula 1. The polymer composition contains a first copolymer 1 with the repeat unit of sequence number 1; and a second polymer with repeat unit of chemical formula 2: *-[-Ar_3-X-]-*. The second polymer contains a repeat unit of chemical formula 2. The polymer contains with a polymer composition and organic solvent.