EXPOSURE APPARATUS FOR OPTICAL REDUCING ADJUSTMENT OF RETICLE

摘要

PURPOSE: An exposure apparatus is provided to use the same reticle without replacing a reticle by mounting a revolver on the bottom of a reduction projection lens. CONSTITUTION: An exposure apparatus comprises a revolver(500). The revolver is installed in a lower part of a reduction projection lens. A 0.8 magnification lens is mounted in one opening of a revolver so that a reticle for a 1/4 reduction projection exposure apparatus is used for a 1/5 reduction projection exposure apparatus. A 1.25 magnification lens is mounted in a lower part of opening of the revolver so that the reticle for the 1/4 reduction projection exposure apparatus is used for the 1/5 reduction projection exposure apparatus.