| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which suppresses occurrence of striation and enables to form a high-quality coating film having uniformity all over, and a display and the like using the same. <P>SOLUTION: The photosensitive resin composition includes a resin (A), a polymerizable compound (B), a polymerization initiator (C), and a solvent (D), wherein the solvent (D) contains a solvent represented by the formula (D1): (D1) R<SP>1</SP>-O-(A-O)<SB>n</SB>-R<SP>2</SP>, wherein R<SP>1</SP>and R<SP>2</SP>each independently represent linear or branched 1-4C alkyl; A represents linear or branched 1-3C alkylene; n represents an integer of 2 or 3; and a plurality of symbols A may be the same or different. <P>COPYRIGHT: (C)2010,JPO&INPIT |
