发明名称 High frequency semiconductor device and method of manufacture
摘要 A semiconductor device (10) having a gate (15), a source (19), and a drain (20) with a gate bus (25) and first ground shield (24) patterned from a first metal layer and a second ground shield (31) patterned from a second metal layer. The first ground shield (24) and the second ground shield (31) lower the capacitance of device (10) making it suitable for high frequency applications and housing in a plastic package.
申请公布号 KR100968058(B1) 申请公布日期 2010.07.08
申请号 KR20047013324 申请日期 2003.02.19
申请人 发明人
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
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