| 摘要 |
PURPOSE: A shower head and an atomic layer deposition device thereof are provided to uniformly maintain the temperature of deposition gas by uniformly heating deposition gas after arranging a heater unit in a shower head. CONSTITUTION: A process chamber(101) stores a substrate(10). A susceptor(102) is located inside the process chamber. A plurality of injection holes(131) are formed in a jet block. A jet buffer(132) is located in the upper part of the jet block. A heater unit(133) is located inside the jet buffer. The heater unit heats deposition gas which is sprayed through a spray hole.
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