| 摘要 |
The method involves creating a set of lines oriented in a direction on a layer of photosensitive material on a substrate, using a standing wave interference pattern. A portion of the created lines is trimmed to create a sub-pattern. Another set of lines oriented in another direction is created on another photosensitive layer and a portion of the created lines is trimmed to create another sub-pattern. An independent claim is also included for a system for producing a pattern on a substrate. |
