| 摘要 |
<p>PURPOSE: A phase shifting mask and a manufacturing method thereof are provided to prevent the diffusion of a phase shifter by forming a second transparent substrate on the top of a first transparent substrate with a groove. CONSTITUTION: Provided is a first transparent substrate(100). A patterning process is performed for forming a groove on the first transparent substrate. A phase shifter(104) is filled inside a groove. A second transparent substrate(106) is formed on the first transparent substrate so that the leakage of the phase shifter is prevented. The phase shifter uses one among materials having different light transmission.</p> |
