发明名称 Method of generating discharge plasma
摘要 A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm−3 or larger and an electron temperature of 1.5 eV or lower at a supplied power of 1.0 W/cm2 or more per a unit area of a discharge electrode.
申请公布号 US7750574(B2) 申请公布日期 2010.07.06
申请号 US20070653833 申请日期 2007.01.17
申请人 NGK INSULATORS, LTD. 发明人 SAITO TAKAO;TERAZAWA TATSUYA;KONDO YOSHIMASA
分类号 H05B31/26 主分类号 H05B31/26
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