发明名称 |
METHOD FOR DETECTING ALIGN MARK USING INVARIANT MOMENT AND APPARATUS THEREOF |
摘要 |
PURPOSE: Alignment mark detection method and device using an invariable moment are provided to detect an alignment mark regardless of the movement, rotation and distortion of the alignment mark by calculating a specific invariable moment using an image on a specific point of a wafer. CONSTITUTION: An alignment mark detection method using an invariable moment is as follows. A specific invariable moment is calculated using an image on a specific point of a wafer(130). The specific invariable moment is compared with the reference-invariable moment which is previously calculated and stored from the image of an alignment mark(140). As a result of the comparison, a specific point of the wafer is established as the location of the alignment mark in case the specific invariable moment is the same to the reference-invariable moment(150).
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申请公布号 |
KR20100076637(A) |
申请公布日期 |
2010.07.06 |
申请号 |
KR20080134751 |
申请日期 |
2008.12.26 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
CHUNG, HUM;SEO, JONG MO;KIM, HYOUN JIN;SHIN, JONG HO |
分类号 |
H01L21/66;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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