| 摘要 |
PURPOSE: A vertical furnace for manufacturing a semiconductor device is provided to uniformly distribute a temperature by compensating for the temperature on the uppermost and lowermost sides of the vertical furnace. CONSTITUTION: A process tube(12) comprises a wafer boat inside. The wafer boat includes a plurality of slots. A plurality of wafers is mounted on the wafer boat. A reactive gas is supplied to a process tube. A first heater(20) is separated from the outside of the side of the process tube. A second heater(30) is separated from the outside of the upper side of the process tube.
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