| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide sintered magnesium oxide which can allow a deposition rate of a thin film to be made higher when the thin film is deposited by using the sintered magnesium oxide as a vapor deposition material, which can allow the generation of splashes to be restrained when the thin film is deposited and which can allow a discharge starting voltage to be made lower when the vapor-deposited thin film is used as a protective film for a PDP (plasma display panel). <P>SOLUTION: The sintered magnesium oxide contains magnesium oxide, 9-50 mass% oxide of a group 2A element other than magnesium in the periodic table and 1-10,000 ppm oxide of a group 3B element, a group 3A element or a group 4A element in the periodic table. <P>COPYRIGHT: (C)2010,JPO&INPIT |
