发明名称 METHOD AND SYSTEM DETECTING METAL LINE FAILURE
摘要 In a method of detecting metal line failures for a full-chip, a first net-list is converted to a second net-list. The first net-list includes first information related to elements and metal lines, and the second net-list includes second information susceptible to direct current analysis. Current densities of the metal lines are calculated by performing the direct current analysis on the second net-list. Defective metal lines among the metal lines are detected based on the current densities of the metal lines.
申请公布号 US2010169855(A1) 申请公布日期 2010.07.01
申请号 US20090635873 申请日期 2009.12.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YANG GI-YOUNG;KIM SE-YOUNG
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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