COMPOSITION FOR FOAMING HARDMASK LAYERS AND METHOD OF PRODUCING PATTERNED MATERIALS USING THE SAME

摘要

PURPOSE: A composition for forming a hard-mask layer and a manufacturing method of a patterned material using thereof are provided to improve the anti-reflection property applied to a short wavelength area and to apply a coating spin-on method. CONSTITUTION: A composition for forming a hard-mask layer contains a copolymer marked with chemical formula 1. In chemical formula 1, R1 is a substituted or non-substituted alkylene of C1~C4. R2, R3, R7, and R8 are hydrogen, a hydroxyl group, a straight, branched, or cyclic alkyl group of C1~C10, an alkoxy group, or an aryl group of C6~C20. R4, R5, and R6 are the hydrogen, the hydroxyl group, an alkyl ether group of C1~C4, a phenyl dialkylene ether group, or their combination.