SYSTEM AND METHOD FOR DETECTING ONE OR MORE WINDING PATHS FOR PATTERNS ON A RETICLE FOR THE MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUITS

摘要

A system and method for detecting one or more winding paths for patterns on a reticle for the manufacture of semiconductor integrated circuits. A method for detecting invalid winding path in a layout design. The method includes the step of obtaining a first winding path parameter and a second winding path parameter. The method includes defining a first plurality of reticle patterns in accordance with the first winding path parameter and the second winding path parameter. The first winding path parameter has a first value. The first plurality of reticle patterns is associated with the least one winding path. The method additionally includes defining a second plurality of reticle patterns in accordance with the second winding path parameter and the second winding path parameter. The first winding path parameter has a second value. The second plurality of reticle patterns is associated with the at least one winding path. Moreover, the method includes comparing the first plurality of reticle patterns against the second plurality of reticle patterns.